Ion Sputter Coater An ion sputtering device is used to coat the surface of a sample by emitting ions through a metal target. Ion emission is caused by plasma discharge under low voltage conditions. This coating device is used as a pre-processing device to obtain clear images of the SEM. The purpose of this coating device is to allow the sample to increase the number of secondary electrons emitted by the electron beam when the conductivity of the sample increases. This coating device covers the sample in vacuum under low voltage conditions and does not cause damage due to electronic stimulus. It is designed for easy coating of the sample by simply pressing the "Start" button for maximum user convenience. > Touch-sensitive LCD panel for easy adjustment of amperage, coating time, vacuum and other settings; > Save/import setup conditions (maximum of 8 conditions) Specification 1. SCM-200 (Polaris) > Target Material: Au or Pt > Target size: ￠ 50mm > Camera size: 3,133 ×110 (mm) > Sample table size: ￠ 50mm > Interval between electrode and sample tables: 35 mm > Size: 505(W) x310(L) x 250(H) / 10 kg
