Secondary Ion Mass Spectrometer TOF-SIMS - SURFACE SEARS
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Understanding surface chemistry is no longer limited to university research laboratories, but is now becoming increasingly important for many areas of mass production; even a simple clear package is a high-tech material system with multiple layers having different functions.Instruments for ground-based research, as a rule, were very expensive and required qualified personnel for their operation and interpretation of data. It meant, that the acquisition of ground-based instruments in industry was limited to large central research laboratories of large companies.
Kore is pleased to present a solution: an affordable and compact system for rapid chemical determination of the SurfaceSeer S. SurfaceSeer S is designed as an affordable workhorse from the TOF-SIMS series. It is ideal for studying the chemical composition of sample surfaces and is equally well suited for research and development or for quality control in industry.
Specifications
PRIMARY ION CANNON
The device uses a Cs + 5 kV ion beam (not necessarily an Ar+ inert gas), which pulsates to minimize surface damage that could otherwise be caused by a continuous ion beam.The gun delivers a pulse of only 60 ns in each TOF cycle of 100 microseconds, and thus the primary beam provides a current more than 1000 times less than with continuous switching.A typical experiment time of 10 s provides a dose equivalent to just a few milliseconds of continuous beam current. It would take several minutes of analysis in one place, to reach the so-called "static SIMS" limit, the point at which surface damage becomes clearly visible in the data (depends on the focus and beam current).Despite the low ion doses, the TOF analyzer is very efficient, and this explains the high transfer rate of secondary ions (usually 5000 s/s even for polymers with a relatively low ion yield). If necessary, the primary ion current can be increased, and the ion gun is switched on continuously and rasterically for spray cleaning of suitable samples.
DEFERRED MINING
The device also uses a technique known as "delayed extraction" for the secondary ions produced.In this method, primary ions bombard the surface and produce analytically important secondary ions.Shortly after the pulse of the primary beam has completed the bombardment of the sample, the pulse extraction pulse field turns on.This leads not only to the extraction of secondary ions, but also to the compression of secondary ions when the ions pass through the analyzer to the detector.In some TOF-SIMS devices, the primary beam is compressed or "grouped", but secondary ions are grouped in this device.This delayed extraction is set so that secondary ions of the same m/z are focused in time to obtain a better mass resolution than would otherwise be obtained with a long primary pulse (60 ns).
CHARGE NEUTRALIZATION
One of the advantages of using a combination of pulsed ion beam/delayed extraction is that there are relatively long periods in each TOF cycle when the ion extraction field is not applied.During this period, a pulse of low-energy electrons (30 eV) is sent to the analytical zone.By doing this, it is possible to neutralize the effect of a positive charge that would otherwise accumulate on the surface, since the primary ion beam bombards the insulating sample.
TOF ANALYZER
The device has a 150 mm diameter reflectronic analyzer with a total effective flight length (including a flight tube) 2 meters.This is a two-slope reflectron with high-precision in-vacuo resistors, having an adjustable delay potential in the reflectron, which has been tuned for optimal spectral characteristics.
VACUUM PUMPING
The device has a rack-mounted vacuum controller that controls the vacuum system.Turbomolecular pumps are used to maintain vacuum in the analytical chamber and the sample loading retainer, each of which is supported by a two-stage rotary pump.Unloading and pumping of the blocking load is carried out using a single manual button on the vacuum controller.A high-vacuum pressure gauge (inverted magnetron) continuously monitors the pressure in the analytical chamber and is used to provide a vacuum lockout by shutting off high voltages, if the pressure rises above the set value.
